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Studies from YSU provide new data on thin solid films

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  • Studies from YSU provide new data on thin solid films

    Nanotechnology Weekly
    January 26, 2009


    THIN SOLID FILMS;
    Studies from Yerevan State University provide new data on thin solid films




    According to recent research from Yerevan, Armenia, "Porous silicon
    layer was formed by electrochemical anodization on n- and p-type
    silicon surface. Thereafter n-type TiC1.98 and ZnO < AI > thin films
    were deposited onto porous silicon surface by electron-beam
    evaporation and magnetron sputtering, respectively."

    "A Pt catalytic layer and Au electrical contacts for further
    electrical measurements were deposited by ion-beam sputtering. Changes
    in sensitivity versus time of obtained structures were examined for
    different concentrations of hydrogen gas and propane-butane
    mixture. High sensitivity and selectivity to hydrogen gas was
    detected," wrote V.E. Galstyan and colleagues, Yerevan State
    University.

    The researchers concluded: "All measurements were carried out at 40
    degrees C."

    Galstyan and colleagues published their study in Thin Solid Films
    (Investigations of hydrogen sensors made of porous silicon. Thin Solid
    Films, 2008;517(1):239-241).

    For additional information, contact V.M. Aroutiounian, Yerevan State
    University, Dept. of Physics Semicond & Microelect, Yerevan 0025,
    Armenia.

    Publisher contact information for the journal Thin Solid Films is:
    Elsevier Science SA, PO Box 564, 1001 Lausanne, Switzerland.
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